* [Distributed Computing](https://en.wikipedia.org/wiki/Distributed_computing): Computer with components working towards common goal with without strict coupling.
* [Fault Tolerance](https://en.wikipedia.org/wiki/Fault_tolerance): The ability of a system to keep operating in the event of failure of one of its components.
* [FRAM](https://en.wikipedia.org/wiki/Ferroelectric_RAM): Non-volatile RAM based on ferroelectric layer.
* [FPGA](https://en.wikipedia.org/wiki/Field-programmable_gate_array): Field-programmable gate array is a chip that can be reprogrammed "in the field".
* [Priority Encoder](https://en.wikipedia.org/wiki/Priority_encoder): A circuit or algorithm that compresses multiple binary inputs into a smaller number of outputs
* [RAID](https://en.wikipedia.org/wiki/RAID): Redundant array of disks
* [Reconfigurable Computing](https://en.wikipedia.org/wiki/Reconfigurable_computing): Collection of customizable datapaths connected together by a fabric
* [RISC](https://en.wikipedia.org/wiki/Reduced_instruction_set_computing): Reduced instruction set computing
* [Chip](https://en.wikipedia.org/wiki/Integrated_circuit): A set of electronic circuits on one small plate ("chip") of semiconductor material, normally silicon.
* [Clock domain crossing](https://en.wikipedia.org/wiki/Clock_domain_crossing): Traversal of signal in synchronous digital ssytem from one clock domain to another.
* [DFT](https://en.wikipedia.org/wiki/Design_for_testing): Design for test
* [Die](https://en.wikipedia.org/wiki/Die_%28integrated_circuit%29): Small block of semiconductor material that can be cut ("diced") from a silicon wafer.
* [DV](https://en.wikipedia.org/wiki/Functional_verification): Design verification is the process of verifying that the logic design conforms to specification.
* [ESD](https://en.wikipedia.org/wiki/Electrostatic_discharge): Electrostatic discharge is the sudden flow of electricity between two electrically charged objects.
* [Fabless](https://en.wikipedia.org/wiki/Fabless_manufacturing): The design and sale of semiconductor devices while outsourcing the manufacturing to 3rd party.
* [FEOL](https://en.wikipedia.org/wiki/Front_end_of_line): Front end of line processing. Includes all chip processing up to but not including metal interconnect layers.
* [Flip-flop](https://en.wikipedia.org/wiki/Flip-flop_(electronics)): A clocked circuit that has two stable states and can be used to store state information.
* [Foundry](https://en.wikipedia.org/wiki/Semiconductor_fabrication_plant): Semiconductor company offering manufacturing services.
* [Hold time](https://en.wikipedia.org/wiki/Flip-flop_%28electronics%29#Setup.2C_hold.2C_recovery.2C_removal_times): Minimum time synchronous input should hold steady after clock event.
* [Latchup](https://en.wikipedia.org/wiki/Latch-up): Short circuit due to creation of a low-impedance path between the power supply rails of a circuit.
* [Mask Works](https://en.wikipedia.org/wiki/Integrated_circuit_layout_design_protection): Copyright law dedicated to 2D and 3D integrated circuit "layouts".
* [Metastability](https://en.wikipedia.org/wiki/Metastability_in_electronics): Ability of a digital electronic system to persist for an unbounded time in an unstable equilibrium.
* [Moore's Law](https://en.wikipedia.org/wiki/Moore%27s_law): Observation by Moore that the number of transistors in an IC doubles approximately every two years.
* [MOSIS](https://en.wikipedia.org/wiki/MOSIS): Foundry service project offering MPWs and low volume manufacturing.
* [MPW](https://en.wikipedia.org/wiki/Multi-project_wafer_service): Multi-project wafer service that integrates multiple designs on one reticle (aka "shuttle").
* [Multi-threshold CMOS](https://en.wikipedia.org/wiki/Multi-threshold_CMOS): CMOS technology with multiple transistor types with different threshold voltages.
* [Optical proximity correction](https://en.wikipedia.org/wiki/Optical_proximity_correction): Technique used to compensate for semiconductor diffraction/process effects.
* [PDK](https://en.wikipedia.org/wiki/Process_design_kit): Process design kits consisting of a minimum set of files needed to design in a specific process.
* [PVT Corners](https://en.wikipedia.org/wiki/Process_corners): Represents the extreme process, voltage, temperature that could occur in a given semiconductor process.
* [Setup time](https://en.wikipedia.org/wiki/Flip-flop_%28electronics%29#Setup.2C_hold.2C_recovery.2C_removal_times): Minimum time synchronous input should be ready before clock event.
* [SEU](https://en.wikipedia.org/wiki/Single_event_upset): Change of state caused by one single ionizing particle (ions, electrons, photons...).
* [Signoff](https://en.wikipedia.org/wiki/Signoff_%28electronic_design_automation%29): The final approval that the design is ready to be sent to foundry for manufacturing.
* [STA](https://en.wikipedia.org/wiki/Static_timing_analysis): Method of computing the expected timing of a digital circuit without requiring full circuit simulation.
* [Standard Cell Design](https://en.wikipedia.org/wiki/Standard_cell): Design process relying on a fixed set of standard cells.
* [Subthreshold Leakage](https://en.wikipedia.org/wiki/Subthreshold_conduction): Current between source and drain in MOSFET when transistor is "off".
* [Synchronous logic](https://en.wikipedia.org/wiki/Synchronous_circuit): Logic whose state is controlled by a synchronous clock.
* [Synthesis](https://en.wikipedia.org/wiki/Logic_synthesis): Translation of high level design description (e.g. Verilog) to a netlist format (e.g. standard cell gate level).
* [SystemC](https://en.wikipedia.org/wiki/SystemC): Set of C++ classes and macros for simulation. Commonly used for high level modeling and testing.
* [VLSI](https://en.wikipedia.org/wiki/Very-large-scale_integration): Very large Integrated Circuit (somewhat outdated term, everything is VLSI today).
* [Von Neumann architecture](https://en.wikipedia.org/wiki/Von_Neumann_architecture): Computer architecture in which instructions and data are stored in the same memory.
* [FinFet](https://en.wikipedia.org/wiki/Multigate_device): Non planar, double-gate transistor.
* [Photo-lithography](https://en.wikipedia.org/wiki/Photolithography): Process used in micro-fabrication to pattern parts of a thin film or the bulk of a substrate.
* [Photomasks](https://en.wikipedia.org/wiki/Photomask): Opaque plates with holes or transparencies that allow light to shine through in a defined pattern.
* [Reticle](https://en.wikipedia.org/wiki/Photomask): A set of photomasks used by a stepper to step and print patterns onto a silicon wafer.
* [Stepper](https://en.wikipedia.org/wiki/Stepper): Machine that passes light through reticle onto the silicon wafer being processed.
* [TSV](https://en.wikipedia.org/wiki/Through-silicon_via): Vertical electrical connection (via) passing completely through a silicon wafer or die.
* [Wafer](https://en.wikipedia.org/wiki/Wafer_(electronics)): Thin slice of semiconductor material used in electronics for the fabrication of integrated circuits.
* [3D IC's](https://en.wikipedia.org/wiki/Three-dimensional_integrated_circuit): The process of stacking integrated circuits and connecting them through TSVs.
* [BGA](https://en.wikipedia.org/wiki/Ball_grid_array): Ball grid array is a type of surface-mount packaging (a chip carrier) used for integrated circuits.
* [Through-hole](https://en.wikipedia.org/wiki/Through-hole_technology): TPackage pins inserted in drilled holes and soldered on opposite side of the board.
* [Arbitrary Waveform Generator](https://en.wikipedia.org/wiki/Arbitrary_waveform_generator): Electronic instrument used to generate arbitrary signal waveforms.
* [DIB](https://en.wikipedia.org/wiki/DUT_board): Device Interface Board for interfacing DUT to ATE. Also called DUT board, probe card, load board, PIB.
* [JTAG](https://en.wikipedia.org/wiki/Joint_Test_Action_Group): Industry standard for verifying and testing/debugging printed circuit boards after manufacturing.
* [Spectrum Analyzer](https://en.wikipedia.org/wiki/Spectrum_analyzer): Electronic instrument for measuring the power of the spectrum of an unknown signal.